The Mitutoyo Finescope 70 (FS70) microscopes (Mitutoyo PN 378-) provide an erect image with a maximum magnification of 4000x to facilitate accuracy to sub-micron levels for ultra-microscopic manufacturing technologies in today's industrial world. Combining Mitutoyo's optical technologies and precision measurement technologies, the Finescope FS70 microscopes can be integrated into systems and equipment for manufacturing, research and development, and product inspection.  The Finescope FS70 product line was created for brightfield viewing, darkfield viewing, Differential Interference Contrast (DIC) and for polarized imaging. (The FS70L and FS70L4 do not support DIC observation.)

• Brightfield observation is a simplest specimen illumination method for general microscopy. This method uses reflected light from the specimen, or as light is transmitted from below and observed from above. Specimen contrast due to attenuation of the transmitted light in dense or light absorbtive areas of the sample. The typical appearance of a bright-field microscopy image is either a reflected bright image on dark background, or as a dark (attenuated) sample image on a bright background field. 

• Dark field observation is excellent for observing scratches, dust, and uneven surfaces, particularly for specimens with low reflectivity. The image is created by illuminating the sample with light that will not be collected by the objective lens and thus will not form part of the image. This produces the classic appearance of a dark, almost black, background with bright objects on it. 

• Polarization filters are used to observe optical characteristics of minerals, plastics, and liquid crystals. 

• Differential Interference Contrast (DIC) method, also known as Nomarski interference contrast (NIC), offers excellent depth detection to enhance the contrast in unstained, transparent samples. This makes it ideal for observations of metals, crystals, semiconductors, thinfilm coatings, LCDs or any material with ultra-small scratches, steps, and uneven surfaces. . The DIC method works on the principle of interferometry to create an image with the target specimen seen shades from dark to light on a gray background field. 

Applications

• Very high quality compact microscope with addition of a simple microscope stand, illumination, turret, objective lens and eyepieces, each sold separately, 
• Ideal for a prober station for semiconductors, 
• Micron level inspections,
• The FS70L and FS70L4 can be equipped with YAG Laser, however Careful selection of laser system is required due to possible performance issues, risk of system and component damage, and critical personnel safety issues.
• Cut semiconductor circuits,
• Repair liquid crystal substrates,
• Remove protective films,
• Trim organic thin films,
• Cutting of IC wiring (Au, Al) and exposure of lower layer pattern
• Photomask repair, 
• Marking and inscribing,
• Trimming and patterning, 
• Spot annealing. 

Features

• High performance optical system originally developed for the best-selling Finescope 60 models and further enhanced to create the Finescope 70 (FS70) product line.
• The FS70L supports three types of YAG laser wavelength ranges (1064nm, 532nm and 355nm), while the FS70L4 supports two types of wavelength ranges (532nm and 266nm) for a broad scope of laser applications. 
• Brightfield, Differential Interference Contrast (DIC) and polarized observations are optional with FS70Z and FS70. The FS70L and FS70L4 do not support the DIC method.
• Inward revolver turret and the long working distance objectives for ease of operation. 
• Erect image optical system creates an image in the field of view which has the same orientation as the specimen.
• Enlarged fine focus adjustment wheel with rubber-grip coarse adjustment knob for enhanced ergonomics and adjustment control.

Specifications

• All models CE marked,
• Standard inward-revolver, Optional revolvers with the center adjustment and parfocal mechanisms are available,
• Erect Image: Image orientation same as the specimen,
• Field Number/Eyepiece Diaphragm (mm):  FN=24,
• Pupil distance: Siedentopf type, adjustment range: 2 - 3” / 51 - 76mm,
• Ergonomic Tilt Head Angle:  0º - 20º (-T and -TH versions only),
• YAG laser limitations (axial and non-polarized only):

• Wavelength	10ns Pulse (J/cm2)		CW (kW/cm2)
  	FS70L	FS70L4	FS70L	FS70L4
  1064 nm	0.094	NA	0.23	NA
  532 nm	0.075	0.075	0.18	0.2
  355 nm	0.018	NA	0.06	NA
  266 nm	NA	0.015	NA	0.05

Careful selection of laser system is required due to possible performance issues, risk of system and component damage, and critical personnel safety issues.

• Dimensions:  

FS70 and FS70Z

FS70L

FS70L4

Tilting Head Dimensions

Fiberoptic Port Detail

Mounting Detail

• Focus Mechanism:  
• Travel Range:  50mm 
• Fine Adjust:  0.1mm/rev. 
• Coarse Adjust: 3.8mm/rev. 
• Short focus units mount 68mm higher on microscope stand than the standard focus blocks:  

Optional Accessories

• Objective lenses

• Fiberoptic illumination systems (Click Here to Order.)

• Manual or motorized turrets

• WF Series Eyepieces (Click Here to Order)

• Reticles

• Cross-hair
• Broken cross hair (90º and 60º)
• Concentric circle (Diametric increment: 1.2mm)
• 20mm scale (Minimum reading: 0.1mm) with cross hair
• 10mm scale (Minimum reading: 0.1mm)
• 5mm scale (Minimum reading: 0.05mm) 
• Microscope Stand